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Thin-film deposition technique that deposits one 1-atom thick layer at a time
Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical
Atomic_layer_deposition
Vapour phase thin film deposition technique
Essentially, MLD resembles the well established technique of atomic layer deposition (ALD) but, whereas ALD is limited to exclusively inorganic coatings
Molecular_layer_deposition
Dutch information technology company
in fabrication plants for processes such as atomic layer deposition, epitaxy, chemical vapor deposition, and diffusion. The company was founded by Arthur
ASM_International
Method that removes material, one 1-atom thick layer at a time
(2014-12-01). "A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy". Chemical Vapor Deposition. 20 (10–11–12): 332–344. doi:10
Atomic_layer_etching
Atomic layer epitaxy (ALE), more generally known as atomic layer deposition (ALD), is a specialized form of thin film growth (epitaxy) that typically
Atomic_layer_epitaxy
Thin layer of material
Many growth methods rely on nucleation control such as atomic-layer epitaxy (atomic layer deposition). Nucleation can be modeled by characterizing surface
Thin_film
Soviet scientist and administrator (1912–2006)
reactions underpinning the thin film deposition technique that years later became known as atomic layer deposition. He was the rector of Leningrad Technological
Valentin_Aleskovsky
created using atomic layer deposition (ALD) with unique physical, chemical, and electronic properties. For example, a rough oxide layer can be further
Nanolamination
Entity in a chemical reaction
interest in diffraction patterns by differentiating by phase. In atomic layer deposition, the substrate acts as an initial surface on which reagents can
Substrate_(chemistry)
Chemical compound
a thin film is a prerequisite and the preferred growth mode is atomic layer deposition, Al2O3 films can be prepared by the chemical exchange between trimethylaluminium
Aluminium_oxide
Finnish physicist and inventor
materials science, developing the thin film growth technique called atomic layer deposition. Suntola was born in Tampere, Pirkanmaa, in 1943, during the Continuation
Tuomo_Suntola
American manufacturing company
etch and deposition, metal organic chemical vapor deposition (MOCVD), wet wafer processing, molecular beam epitaxy (MBE), atomic layer deposition (ALD),
Veeco
Method used to apply surface coatings
of. CVD is extremely useful in the process of atomic layer deposition at depositing extremely thin layers of material. A variety of applications for such
Chemical_vapor_deposition
Use of nanotechnology to improve lithium-ion batteries
trenches. The requisite layers, an anode, separator, and cathode, for a battery were then added by low-pressure chemical vapor deposition. The battery consists
Nanoarchitectures for lithium-ion batteries
Nanoarchitectures_for_lithium-ion_batteries
American computer memory manufacturer
Sandhu and Trung T. Doan at Micron initiated the development of atomic layer deposition high-k films for DRAM memory devices. This helped drive cost-effective
Micron_Technology
Boron-oxygen anion or functional group
evaporation (e.g. CrBO3, β-BaB2O4), pulsed laser deposition (e.g. β-BaB2O4, Eu(BO2)3), and atomic layer deposition (ALD). Growth by ALD was achieved using precursors
Borate
Chemical process
re-entrainment. Atomic layer deposition Chemical vapor deposition Deposition (physics) Fouling Physical vapor deposition Thin-film deposition Fused filament
Deposition_(chemistry)
American semiconductor equipment company
electrochemical deposition (ECD) and chemical vapor deposition (CVD) technologies to form copper and other metal films for conducting structures. Atomic layer deposition
Lam_Research
Manufacturing process used to create integrated circuits
(CVD) Metal organic chemical vapor deposition (MOCVD), used in LEDs Atomic layer deposition (ALD) Physical vapor deposition (PVD) Sputtering Evaporation Epitaxy
Semiconductor device fabrication
Semiconductor_device_fabrication
Alternative to silicon-based photovoltaics
TiO2 layer deposition be compatible with flexible polymer substrate, low-temperature techniques, such as atomic layer deposition, molecular layer deposition
Perovskite_solar_cell
Chemical compound
chemical vapor deposition or atomic layer deposition. The Al2O3 provides excellent surface passivation of p-doped silicon surfaces. The Al2O3 layer is typically
Trimethylaluminium
Electronic component
University of Connecticut are using a technique called selective area atomic layer deposition that is capable of producing them reliably and at industrial scales
Optical_rectenna
Technology with features near one nanometer
focused ion beam machining, nanoimprint lithography, atomic layer deposition, and molecular vapor deposition, and further including molecular self-assembly
Nanotechnology
Illuminated flat panel display
electroluminescent material is deposited using atomic layer deposition, which is a process that deposits one 1-atom thick layer at a time. EL works by exciting atoms
Electroluminescent_display
Technique for making thin films
Layer-by-layer (LbL) deposition is a thin film fabrication technique. The films are formed by depositing alternating layers of complementary materials
Layer_by_layer
American chemist and researcher
Department of Energy's Argonne National Laboratory. He leads Argonne's atomic layer deposition (ALD) research program, where he directs research and development
Jeffrey_Elam
Observation on the growth of integrated circuit capacity
alternatives to more traditional MOSFET designs. In the early 2000s, the atomic layer deposition high-κ film and pitch double-patterning processes were invented
Moore's_law
before traditional packaging ALD – see atomic layer deposition atomic layer deposition (ALD) – chemical vapor deposition process by which very thin films of
Glossary of microelectronics manufacturing terms
Glossary_of_microelectronics_manufacturing_terms
Vaporizing laser beam in a vacuum chamber
Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to
Pulsed_laser_deposition
Chemical compound
compounds. LiHMDS is volatile and has been discussed for use for atomic layer deposition of lithium compounds. Like many organolithium reagents, lithium
Lithium bis(trimethylsilyl)amide
Lithium_bis(trimethylsilyl)amide
Chemical element with atomic number 72 (Hf)
microelectronics manufacturing as a source of hafnium oxide in atomic layer deposition, much in the same way as zirconium(IV) chloride. The white hafnium
Hafnium
Vehicle propelled fully or mostly by electricity
mechanism nanoscale solid-state lithium-ion supercapacitors using atomic layer deposition-synthesized lithium phosphorus oxynitride (LiPON) as solid-state
Electric_vehicle
Material with a high permittivity relative to silicon dioxide
hafnium dioxide and zirconium dioxide, typically deposited using atomic layer deposition. It is expected that defect states in the high-κ dielectric can
High-kappa_dielectric
Chemical processing technique
Single layer etching is a chemical processing technique that removes material one atomic or molecular layer at a time. Manufacturers apply the technique
Single_layer_etching
Finnish consumer electronics company
Dr. Tuomo Suntola. The EL displays were manufactured using the atomic layer deposition (ALD) process developed in the project, and were marketed also
Finlux
Diode that emits light from an organic compound
using inkjet printing, and the inorganic layers are applied using Atomic Layer Deposition (ALD). The encapsulation process is carried out under a nitrogen
OLED
Chemical compound
bonds. It is used in chemical vapor deposition to prepare titanium nitride (TiN) surfaces and in atomic layer deposition as a titanium dioxide precursor.
Tetrakis(dimethylamido)titanium
Tetrakis(dimethylamido)titanium
Chemical compound
space group Pmnb/Pnma. Thin films of hafnium oxides deposited by atomic layer deposition are usually crystalline. Because semiconductor devices benefit
Hafnium(IV)_oxide
Chemical compound
tantalum(V) oxide films can also be prepared by atomic layer deposition or by a pulsed chemical vapour deposition technique in which tantalum(V) ethoxide and
Tantalum(V)_ethoxide
December 2014). "A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy". Chemical Vapor Deposition. 20 (10–11–12): 332–344. doi:10
List_of_multiple_discoveries
Layer of material with nanometer-scale thickness
be created using both synthetic and natural polymer materials. Atomic layer deposition (ALD) is a vapor-phase technique used to produce films with high
Nanofilm
Chemical compound
It has been reported (2006) as being grown as a thin film by atomic layer deposition at temperatures between 140 and 240 °C using W2(N(CH3)2)6 as a
Tungsten(III)_oxide
High-capacity electrochemical capacitor
electrical conductivity (106 S/m) and MnO2's pseudocapacitance. Atomic layer deposition (ALD) creates uniform MnO2 coatings on graphene nanosheets, achieving
Supercapacitor
Chemical element with atomic number 41 (Nb)
layered niobium sulfide (NbS2) is also known. Materials can be coated with a thin film of niobium(V) oxide chemical vapor deposition or atomic layer deposition
Niobium
American chemist (born 1940)
including chemical vapor deposition and atomic layer deposition (ALD). His group demonstrated methods for rapid deposition of conformal thin films, including
Roy_G._Gordon
Finnish technology prize
2018 Tuomo Suntola Finland Atomic layer deposition Committee's reasoning: "Suntola's prize-winning ALD (atomic layer deposition) innovation is a nanoscale
Millennium_Technology_Prize
Compound of silicon and nitrogen
vertical or in a horizontal tube furnace, or Plasma-enhanced atomic layer chemical vapor deposition (PECVD) technology, which works at rather low temperature
Silicon_nitride
Type of field-effect transistor
(gallium nitride) metal–oxide–semiconductor HEMT (MOS-HEMT). It used atomic layer deposition (ALD) aluminum oxide (Al2O3) film both as a gate dielectric and
High-electron-mobility transistor
High-electron-mobility_transistor
American semiconductor equipment company
semiconductor device, including atomic layer deposition (ALD), chemical vapor deposition (CVD), physical vapor deposition (PVD), rapid thermal processing
Applied_Materials
Field-effect transistor made from carbon nanotubes
then deposited on top of the nanotube, either via evaporation or atomic layer deposition. Finally, the top gate contact is deposited on the gate dielectric
Carbon nanotube field-effect transistor
Carbon_nanotube_field-effect_transistor
Object that reflects an image
(2020). "Protective coatings for front surface silver mirrors by atomic layer deposition". Optics Express. 28 (11). Optica Publishing Group: 15753–15760
Mirror
CrystEngComm from 2011 to 2015. Additionally he published books on Atomic Layer Deposition and the synthesis of nanoparticles. "Nicola Pinna". Retrieved 2015-11-28
Nicola_Pinna
Ion layer gas reaction (ILGAR®) is a non-vacuum, thin-film deposition technique developed and patented by the group of Professor Dr. Christian-Herbert
Ion_layer_gas_reaction
emeritus at University of Helsinki, known for his leading research in atomic layer deposition (ALD). Markku Leskelä was the leader of the Finnish Centre of Excellence
Markku_Leskelä
Technology for constructing integrated circuits
Gurtej Singh Sandhu and Trung T. Doan at Micron Technology invented atomic layer deposition high-κ dielectric films, leading to the development of a cost-effective
CMOS
Artificial vacuum with very low pressure
epitaxy (MBE), UHV chemical vapor deposition (CVD), atomic layer deposition (ALD) and UHV pulsed laser deposition (PLD) Angle resolved photoemission
Ultra-high_vacuum
Topics referred to by the same term
Assistive listening device used to improve hearing ability Atomic layer deposition, a thin-film deposition technique Asymmetric Laplace distribution, in probability
ALD
surface forces. In 1974 the process of atomic layer deposition for depositing uniform thin films one atomic layer at a time was developed and patented by
History_of_nanotechnology
Metallic elements that are nearly chemically inert
006. Hämäläinen, Jani; Ritala, Mikko; Leskelä, Markku (2014). "Atomic Layer Deposition of Noble Metals and Their Oxides". Chemistry of Materials. 26:
Noble_metal
Antenna for receiving power
a grant from the National Science Foundation. With the use of atomic layer deposition it has been suggested that conversion efficiencies of solar energy
Rectenna
White powder insoluble in water
vapor deposition, metalorganic vapour phase epitaxy, electrodeposition, sputtering, spray pyrolysis, thermal oxidation, sol–gel synthesis, atomic layer deposition
Zinc_oxide
Non-crystalline silicon
more difficult to produce. Atomic layer deposition (ALD) Chemical-mechanical planarization (CMP) Chemical vapor deposition (CVD) Crystalline silicon Ion
Amorphous_silicon
Bioengineer, scientist, innovator and educator
Transformationen/Atomic layer deposition assisted nanostructural transformations" primarily focused on the application of atomic layer deposition to synthesize
Firat_Güder
Chemical compound
epitaxy (MBE), and chemical vapor deposition (CVD), along with more specialized processes such as atomic layer deposition (ALD) and thermal laser epitaxy
Niobium_nitride
American chemical engineer
materials scientist known for her research developing advanced atomic layer deposition (ALD) and etching techniques. Her research focuses on creating
Jane_P._Chang
Public research institute
Spintronics Detail of scanning electron microscope Maia 3 Tescan Atomic layer deposition system Scintillation crystals in Department of Optical Materials
Institute of Physics of the Czech Academy of Sciences
Institute_of_Physics_of_the_Czech_Academy_of_Sciences
Indian-American inventor and semiconductor technologist
several key processes in semiconductor manufacturing, including Atomic Layer Deposition (ALD) of high-κ films for DRAM, pitch-doubling techniques for NAND
Gurtej_Sandhu
Any chemical compound having at least one atom of hafnium
hafnium silicate and zirconium silicate grown by atomic layer deposition, chemical vapor deposition or MOCVD, can be used as a high-κ dielectric as a
Hafnium_compounds
Chinese semiconductor equipment manufacturer
plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) and sub-atmospheric pressure chemical vapor deposition (SACVD). The company's
Piotech
Chemical compound
Nilsen; H. Fjellvåg (2014). "Atomic layer deposition of sodium and potassium oxides: evaluation of precursors and deposition of thin films". Dalton Trans
Sodium_tert-butoxide
State of an immobilized atom in chemistry
substrate be the mean of thermal oxidation or other deposition techniques such as atomic layer deposition (ALD). In the case of the formation of SiOx by thermal
Dangling_bond
Method of thin film application
Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by the phenomenon of sputtering. This involves ejecting material
Sputter_deposition
Chemical element with atomic number 44 (Ru)
Park, Hyoung-Sang; Kang, Sang-Won (2004). "Atomic Layer Deposition of Ruthenium Thin Films for Copper Glue Layer". Journal of the Electrochemical Society
Ruthenium
State of matter
very thin and uniform films deposited at rates much faster than atomic layer deposition, the best other tool for particle coating at this size scale. CO2
Supercritical_fluid
Chemical compound
4202–4207. doi:10.1021/ja908730h. PMID 20201513. Emery, J.D. (2014). "Atomic Layer Deposition of Metastable β-Fe2O3 via Isomorphic Epitaxy for Photoassisted
Iron(III)_oxide
Optically transparent and electrically conductive material
"Transmittance from visible to mid infra-red in AZO films grown by atomic layer deposition system." Solar Energy 86.5 (2012): 1306-1312. | https://doi.org/10
Transparent_conducting_film
Chemical compound
(MBE), metal organic chemical vapor deposition (MOCVD), atomic layer deposition (ALD), and chemical solution deposition are other methods to prepare epitaxial
Bismuth_ferrite
Means of studying the interaction of light and matter
evaporation for creating ultra-clean Josephson junctions, and atomic layer deposition for precise control of tunnel barrier properties. These techniques
Circuit quantum electrodynamics
Circuit_quantum_electrodynamics
Semiconducting material
plasma-enhanced atomic layer deposition (PEALD) process. ALD is a precisely controlled chemical vapor deposition technique that deposits thin films layer by layer using
Indium_gallium_zinc_oxide
Nanomaterial
fabricated by the combination of deep UV lithography, dry etch, and atomic layer deposition (ALD). InGaN/GaN nanorod array light-emitting diodes can be manufactured
Nanorod
Display which can be seen through
by Beneq are Thin Film Electroluminescent Displays enabled by Atomic layer deposition (ALD). This display technology was used by Valtra in 2017 to develop
See-through_display
Type of single-photon detector
tungsten silicide SNSPD. Alternative thin film deposition techniques such as atomic layer deposition are of interest for extending the spectral range
Superconducting nanowire single-photon detector
Superconducting_nanowire_single-photon_detector
Field-effect transistor device
semiconductors in TFTs. These include chemical vapor deposition (CVD), atomic layer deposition (ALD), and sputtering. The semiconductor can also be deposited
Thin-film_transistor
Crystalline materials consisting of a single layer of atoms
stable single-layer materials. The atomic structure and calculated basic properties of these and many other potentially synthesisable single-layer materials
Single-layer_materials
Class of chemical substance
processes, MOF thin films can be grown through the combination of atomic layer deposition (ALD) of aluminum oxide onto a suitable substrate (e.g. FTO) and
Metal–organic_framework
Chemical compound
Räisänen, Jyrki; Ritala, Mikko; Leskelä, Markku (2019-02-12). "Atomic Layer Deposition of PbI2 Thin Films". Chemistry of Materials. 31 (3): 1101–1109
Lead(II)_iodide
Professor of chemical engineering at Stanford University
and renewable energy. Her research group utilizes systems in atomic layer deposition, functionalization of semiconductor surfaces, nanoscale materials
Stacey_Bent
Chemical compound
Väino (1995). "Properties of tantalum oxide thin films grown by atomic layer deposition". Thin Solid Films. 260 (2): 135–142. Bibcode:1995TSF...260..135K
Tantalum_pentoxide
phase epitaxy (LPE) Metal-organic molecular-beam epitaxy (MOMBE) Atomic layer deposition (ALD) The following semiconducting systems can be tuned to some
List of semiconductor materials
List_of_semiconductor_materials
Semiconductor device fabrication technology node
Singh Sandhu of Micron Technology initiated the development of atomic layer deposition high-k films for DRAM memory devices. This helped drive cost-effective
90_nm_process
Chemical process
to layer materials, for which suitable precursors are available, however, this is the case for most metals Chemical vapor deposition Atomic layer deposition
Combustion chemical vapor deposition
Combustion_chemical_vapor_deposition
Chemical compound
various methods, including pulsed laser deposition, molecular beam epitaxy, RF sputtering and atomic layer deposition. As in most thin films, different growth
Strontium_titanate
American scientist and entrepreneur
(January 10, 2011). "Water Splitting by Tungsten Oxide Prepared by Atomic Layer Deposition and Decorated with an Oxygen-Evolving Catalyst". Angewandte Chemie
Stafford_Sheehan
Chemical compound
hafnium silicate and zirconium silicate grown by atomic layer deposition, chemical vapor deposition or MOCVD, can be used as a high-κ dielectric as a
Hafnium(IV)_silicate
Cameron; Marja-Leena Kääriäinen; Arthur Sherman (17 May 2013). Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications.
Remote_plasma
Chemical compound
HfCl4 was considered as a precursor for chemical vapor deposition and atomic layer deposition of hafnium dioxide and hafnium silicate, used as high-κ
Hafnium_tetrachloride
Measurement of the change in frequency of a quartz crystal resonator
(2005-04-16). "GaPO4 Sensors for Gravimetric Monitoring during Atomic Layer Deposition at High Temperatures". Analytical Chemistry. 77 (11): 3531–3535
Quartz_crystal_microbalance
Female contributors to the field of chemistry
and professor at UCLA known for her research developing advanced atomic layer deposition (ALD) and etching techniques with applications in microelectronics
Women_in_chemistry
Crystal growth process relative to the substrate used as seed
material deposition in which new crystalline layers are formed with one or more well-defined orientations with respect to the crystalline seed layer. The
Epitaxy
Thin semiconductors
are atomically thin semiconductors of the type MX2, with M a transition-metal atom (Mo, W, etc.) and X a chalcogen atom (S, Se, or Te). One layer of M
Transition metal dichalcogenide monolayers
Transition_metal_dichalcogenide_monolayers
ATOMIC LAYER-DEPOSITION
ATOMIC LAYER-DEPOSITION
Surname or Lastname
English (Sussex and Kent)
English (Sussex and Kent) : topographic name for someone who lived by a stream, from Old English lacu ‘stream’ (see Lake) + the suffix -er denoting an inhabitant.
Surname or Lastname
English
English : occupational name for a washerman, Anglo-Norman French laver (an agent derivative of Old French laver ‘to wash’, Latin lavare).English : habitational name from High, Little or Magdalen Laver in Essex, named from Old English lagu ‘flood’, ‘water’ + fær ‘passage’, ‘crossing’.English : topographic name for someone living where bulrushes or irises grew, Old English lǣfer.
Boy/Male
Muslim
Tourist, Who visits holy places
Girl/Female
Hindu
The wave
Surname or Lastname
English
English : from the Middle English personal name Saher or Seir. This is probably a Norman introduction of the Continental Germanic personal name Sigiheri, composed of the elements sigi ‘victory’ + heri ‘army’. However, it could also represent a Middle English survival of an unrecorded Old English name, SÇ£here, composed of the elements sÇ£ ‘sea’ + here ‘army’.English : occupational name, from Middle English saghier (see Sawyer) or Old French seieor.English : occupational name for a professional reciter, from an agent derivative of Middle English say(en), sey(en) ‘to say’.English : from a reduced form of Middle English assayer, an agent derivative of assay ‘trial’, ‘test’, Old French essay (from Late Latin exagium, a derivative of exagminÄre ‘to weigh’), hence an occupational name for an assayer of metals or a taster of food.English : occupational name for a maker or seller of say, a type of cloth, from Middle English say + the agent suffix -er. See also Say.Welsh : occupational name from Welsh saer ‘carpenter’ or from saer maen ‘stonecutter’, i.e. mason.French : occupational name for a reaper or mower, from an agent derivative of Old French seer ‘to cut’ (Latin secare).Dutch : occupational name for a weaver of serge, from an agent derivative of saai ‘serge’.Dutch : occupational name from zaaier ‘sower’.
Boy/Male
Latin English German
Great.
Male
Japanese
(富) Japanese name TOMIO means "treasured man."
Surname or Lastname
English
English : occupational name for a maker of cord and string, derived from Middle English lace ‘cord’ (Old French laz, las).
Surname or Lastname
English
English : from an agent derivative of Middle English pleyen ‘to play’, hence an occupational name for an actor or musician or a nickname for a successful competitor in contests of athletic or sporting prowess.
Girl/Female
Hindu, Indian
Wave; Flow
Surname or Lastname
Jewish (eastern Ashkenazic)
Jewish (eastern Ashkenazic) : ornamental name from Yiddish fayer ‘fire’ or Yiddishized form of Feuer.English : variant of Fair.
Surname or Lastname
English
English : from the Norman personal name Raher, composed of the Germanic elements rad ‘counsel’, ‘advice’ + hari, heri ‘army’.French : occupational name for a barber, Old French raier (from rère ‘to shave’).
Boy/Male
Indian
Tourist, Who visits holy places
Surname or Lastname
English
English : habitational name from any of three places in Essex – Layer Breton, Layer de la Haye, and Layer Marney – all named from a river name, Leire, or from Leire in Leicestershire, also named from an identical river name. The river name is of Celtic origin and is probably the base of the tribal name Ligore, found in the place name Leicester.English : nickname or status name from Anglo-Norman French le eyr ‘the heir’. Compare Ayer.English : occupational name for a stone layer, Middle English leyer; the job of the layer was to position the stones worked by the masons.German : habitational name for someone from any of the various placed named Lay, in the Rhineland and Bavaria.
Surname or Lastname
English
English : status name for a mayor, Middle English, Old French mair(e) (from Latin maior ‘greater’, ‘superior’; compare Mayor). In France the title denoted various minor local officials, and the same is true of Scotland (see Mair 1). In England, however, the term was normally restricted to the chief officer of a borough, and the surname may have been given not only to a citizen of some standing who had held this office, but also as a nickname to a pompous or officious person.German and Dutch : variant of Meyer 1.Jewish (Ashkenazic) : variant of Meyer 2.
Boy/Male
Australian, Hebrew, Irish
God has Helped
Boy/Male
German, Welsh
Carpenter
Male
Yiddish
(לֵייזֶער) Yiddish form of Hebrew Elazar, LAZER means "my God has helped."
Surname or Lastname
English
English : variant of Ayer.English : topographic name for someone who lived by an enclosure, Middle English hay (see Hay 1) + the suffix -er(e) denoting an inhabitant.French : occupational name for a warder of woodland, from an agent derivative of Old French haye ‘hedge’, ‘enclosed forest’.South German : from an agent derivative of Middle High German heien ‘to guard or protect’, hence an occupational name for a warden of woodland or crops.Indian (Panjab) : Sikh name based on the name of a Jat clan, also called Her.
Boy/Male
American, Australian, British, English, German, Hebrew, Latin
Headman; Mayor; Farmer; Bringer of Light; Greater
ATOMIC LAYER-DEPOSITION
ATOMIC LAYER-DEPOSITION
Boy/Male
Indian, Sanskrit
A Type of Wood; Sacred; Holy
Boy/Male
Arabic, Indian, Muslim, Sanskrit
Shining; Brilliant
Girl/Female
Indian
Perceiver
Girl/Female
Indian
Girl/Female
Indian
Intelligence, Mind
Girl/Female
Indian
Limitless, Protector
Girl/Female
Indian
Doll
Boy/Male
Australian, British, Christian, English, Latin
Of Laurentium; From the Place of the Laurel Leaves; Diminutive of Lawrence
Boy/Male
Muslim/Islamic
Blessed fortunate
Girl/Female
Tamil
Karnatic musical (Raaga) famous note
ATOMIC LAYER-DEPOSITION
ATOMIC LAYER-DEPOSITION
ATOMIC LAYER-DEPOSITION
ATOMIC LAYER-DEPOSITION
ATOMIC LAYER-DEPOSITION
a.
Pertaining to azote, or nitrogen; formed or consisting of azote; nitric; as, azotic gas; azotic acid.
n.
Degree of atomic attraction; equivalence; valence; also (a later use) the number of atoms in an elementary molecule. See Valence.
n.
That which is laid; a stratum; a bed; one thickness, course, or fold laid over another; as, a layer of clay or of sand in the earth; a layer of bricks, or of plaster; the layers of an onion.
a.
Produced without sexual union; as, agamic or unfertilized eggs.
n.
A lawyer.
a.
Characterized by atony, or want of vital energy; as, an atonic disease.
a.
Containing two atoms.
n.
One who holds to the atomic philosophy or theory.
n.
An Adonic verse.
n.
The doctrine of atoms. See Atomic philosophy, under Atomic.
n.
Nomic spelling.
a.
Of or pertaining to atoms.
a.
Alt. of Atomical
a.
Unaccented; as, an atonic syllable.
a.
Having two replaceable atoms or radicals.
n.
Lager beer.
n.
The fronds of certain marine algae used as food, and for making a sauce called laver sauce. Green laver is the Ulva latissima; purple laver, Porphyra laciniata and P. vulgaris. It is prepared by stewing, either alone or with other vegetables, and with various condiments; -- called also sloke, or sloakan.
a.
Aeolian, 1; as, the Aeolic dialect; the Aeolic mode.
a.
Pertaining to, or characterized by, aptotes; uninflected; as, aptotic languages.
a.
Relating to the etymon; as, an etymic word.